- All sections
- G - Physics
- G03F - Photomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices; materials therefor; originals therefor; apparatus specially adapted therefor
- G03F 1/52 - Reflectors
Patent holdings for IPC class G03F 1/52
Total number of patents in this class: 123
10-year publication summary
10
|
9
|
3
|
14
|
16
|
30
|
16
|
12
|
9
|
3
|
2015 | 2016 | 2017 | 2018 | 2019 | 2020 | 2021 | 2022 | 2023 | 2024 |
Principal owners for this class
Owner |
All patents
|
This class
|
---|---|---|
Taiwan Semiconductor Manufacturing Company, Ltd. | 36809 |
28 |
Applied Materials, Inc. | 16587 |
27 |
Agc, Inc. | 4029 |
16 |
Samsung Electronics Co., Ltd. | 131630 |
7 |
Hoya Corporation | 2822 |
6 |
Carl Zeiss SMT GmbH | 2646 |
5 |
KLA Corporation | 1223 |
3 |
SK Hynix Inc. | 11030 |
2 |
Shin-Etsu Chemical Co., Ltd. | 5132 |
2 |
Boe Technology Group Co., Ltd. | 35384 |
2 |
HKC Corporation Limited | 2951 |
2 |
Chongqing HKC Optoelectronics Technology Co., ltd. | 1330 |
2 |
WI-A Corporation | 16 |
2 |
Kioxia Corporation | 9847 |
2 |
Toppan Photomask Co., Ltd. | 56 |
2 |
Samsung Display Co., Ltd. | 30585 |
1 |
LG Chem, Ltd. | 17205 |
1 |
Nikon Corporation | 7162 |
1 |
United Microelectronics Corp. | 3921 |
1 |
Advanced Mask Technology Center GmbH & Co. KG | 12 |
1 |
Other owners | 10 |